Kinetic wrinkling of an elastic film on a viscoelastic substrate

A compressed elastic film on a compliant substrate can form wrinkles. On an elastic substrate, equilibrium and energetics set the critical condition and select the wrinkle wavelength and amplitude. On a viscous substrate, wrinkle grows over time and the kinetics selects the fastest growing wavelength. More generally, on a viscoelastic substrate, both energetics and kinetics play important roles in determining the critical condition, the growth rate, and the wavelength. This paper studies the wrinkling process of an elastic film on a viscoelastic layer, which in turn lies on a rigid substrate. The film is elastic and modeled by the nonlinear von Karman plate theory. The substrate is linear viscoelastic with a relaxation modulus typical of a cross-linked polymer. Beyond a critical stress, the film wrinkles by the out-of-plane displacement but remains bonded to the substrate. This study considers plane strain wrinkling and neglects the in-plane displacement. A classification of the wrinkling behavior is made based on the critical conditions at the elastic limits, the glassy and rubbery states of the viscoelastic substrate. Linear perturbation analyses are conducted to reveal the kinetics of wrinkling in films subjected to intermediate and large compressive stresses. It is shown that, depending on the stress level, the growth of wrinkles at the initial stage can be exponential, accelerating, linear, or decelerating. In all cases, the wrinkle amplitude saturates at an equilibrium state after a long time. Subsequently, both amplitude and wavelength of the see front matter r 2004 Elsevier Ltd. All rights reserved. .jmps.2004.06.007 12-471-7558; fax: +1-512-471-5500. dress: [email protected] (R. Huang).